UV-LED exposure systems for photolithography (UV-EXP series)

With the UV-EXP series, idonus offers an innovative UV illumination system based on the use of high-power LEDs and high-grade
homogenization optics. This product line finds application in photoresist exposure (UV-LED photolithogaphy and curing) and is
suitable for a wide variety of substrates and photoresists used in MEMS, microfluidics, photonics, semiconductors and photovoltaic
applications. Our standard line of UV illumination products addresses photolithography needs for masks and wafers up to 300 mm
wide (11.8 inches).

Why LED technology?

Until recently, mercury arc lamps were the only sources capable of providing high intensity light suitable for UV photolithography
exposure. Thanks to the advances in LED technology, UV-LEDs have become a very attractive alternative to the hazardous and
energy-consuming mercury lamps.

Along with the ecological and security aspects, the technical advantages of UV-LEDs as compared with traditional mercury lamps
are numerous and significant for photolithography. A foremost advantage of UV-LEDs is that they operate with consistent emission
for very long lifetimes. As a result, daily calibration and maintenance are not required. Furthermore, by being more energy efficient,
LEDs have reduced heating, which greatly simplifies system cooling.

It is noteworthly that LEDs emitting at 365 nm, 405 nm and 435 nm (peak wavelengths) can be combined to mimic the UV-A
spectrum of mercury-arc lamps (i-line, h-line and g-line characteristic peaks of Hg element), as can be seen in this graph.

Benefits of UV-LED exposure

Stable illumination, no daily calibration required

Instant-on, light is ON only during exposure, no mechanical shutter needed

Long lifespan, meaning no more consumable required

Narrow spectrum: no unwanted heating of the substrate and more repeatable process

low power consumption

no maintenance costs